Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 2, 2004, Pages 224-231

  Postek, Michael T ^a   Vladár, András E ^a   Bennett, Marylyn Hoy ^b   Rice, Trisha ^c   Knowles, Ralph ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b TEXAS INSTRUMENTS   (United States)

^c Thermo Fisher Scientific   (United States)

Author keywords

Critical dimension; Environmental microscopy; High pressure; Metrology; Photomask; Scanning electron microscopy; Variable pressure

Indexed keywords

CRITICAL DIMENSION; ENVIRONMENTAL MICROSCOPY; HIGH PRESSURE; VARIABLE PRESSURE;

COMPUTER SIMULATION; ERROR ANALYSIS; HIGH PRESSURE EFFECTS; PHASE SHIFT; SAMPLING; SCANNING; SCANNING ELECTRON MICROSCOPY;

MASKS;

EID: 2542449379     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1668272     Document Type: Article

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