Potentials for high-pressure/environmental SEM microscopy for photomask dimensional metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 315-324

  Postek, Michael T ^a   Vladár, Andras E ^a   Rice, Trisha ^b   Knowles, Ralph ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Thermo Fisher Scientific   (United States)

Author keywords

Critical dimension; Environmental microscopy; High pressure; Metrology; Scanning electron microscopy; SEM

Indexed keywords

CHROMIUM; CONTAMINATION; ELECTRON BEAMS; ELECTRON IRRADIATION; HYDROCARBONS; QUARTZ; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION; ENVIRONMENTAL MICROSCOPY; PHOTOMASK;

MASKS;

EID: 0141612008     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.488115     Document Type: Conference Paper

References (28)

1. Baumgarten, N. (1989). Environmental SEM Premieres. Nature. 341: 81-82.
2. Craven, J. P., F. S. Baker, et al. 2002. Consequences of positive ions on imaging in low vacuum scanning electron microscopy. J. Microsc. 205(1): 96-105.
3. Danilatos, G.D. 1988. Foundations of Environmental Scanning Electron Microscopy, Adv. Electronics and Electron Physics. 71:109-250.
4. Danilatos, G. D. (1991). U.S. #4,992,662: Multipurpose gaseous detector device for electron microscope, ElectroScan Corporation (Wilmington, MA).
5. Danilatos, G.D. 1993. Introduction to the ESEM Instrument. Microsc. Res. and Tech. 25:354-361.
6. Farley, A. N. and Shah, J. 1988. A new detection technique for high pressure SEM. EUREM 88, Inst. Phys. Conf. Ser. 93(1) 241-242.
7. Farley, A. N. and J. Shah. 1991. High-pressure scanning electron microscopy of insulating materials: a new approach. J. Microsc. 164(2): 107-126.
8. Griffith, E. and D. E. Newbury. 1996. Introduction to the Environmental Scanning Electron Microscopy Issue. Scanning 18(7): 465.
9. Joy, D. C. 2002. The future of e-beam metrology: obstacles and opportunities. Proceedings SPIE 4689:1-10.
10. Mancuso, J. F., W. B. Maxwell, et al. 1989. U.S. #4,880,976: Secondary electron detector for use in a gaseous atmosphere, ElectroScan Corporation (Danvers, MA).
11. Moncrief, D. A., Robinson, V. N. E. and Harris, L. B. 1978. Charge neutralization of insulating surfaces in the SEM by gas ionization. J. Phys. D: Appl. Phys. 11: 2315-2325.
12. Phillipsm M. R., M. Toth M. and Drouin, D. 1999. A Novel Technique for Probe Intensity Profile Characterization in the Environmental Scanning Electron Microscope. Microscopy and Microanalysis 5(2): 294 295.
13. Phillips, M. R., Toth, M. and Griffin, B. 2000. X-ray Microanalysis of Insulators in the ESEM. Microscopy and Microanalysis 6(2): 786 787.
14. Postek, M. T. and A. E. Vladár. 2000. Critical Dimension Metrology in the Scanning Electron Microscope. Handbook of Silicon Semiconductor Metrology (Alain Diebold, ed.) Chapter 14, 295-333. Marcel Dekker, New York.
15. Postek, M. T., Vladár A. E. and Bennett M. H. 2002. Photomask Metrology: Has Anything Really Changed? SPIE 22nd BACUS Symposium on Photomask Technology 4489:293-308.
16. Postek, M. T. 1984a. Critical Dimension Measurement in the Scanning Electron Microscope. SPIE Proceedings Vol. 480:109-118.
17. Postek, M. T. 1984b. Low Accelerating Voltage Inspection and Linewidth Measurement in the Scanning Electron Microscope. SEM/1984/III, SEM, Inc. 1065-1074.
18. Robinson, V. N. E. 1974. A wet stage modification to a scanning electron microscope. Proc. 8th Int. Cong. Electron Microscopy, Canberra, Aust. Acad. Sci.
19. Robinson, V. N. E. 1975. The elimination of charging artefacts in the scanning electron microscope. J. Phys. E: Sci. Instrum. 8: 638-640.
20. Semiconductor Industry Association. 2001. International Technology Roadmap for Semiconductors 2001 Edition. http://public.itrs.net.
21. Stowe, S. J. and Robinson, V. N. E. 1997. The use of helium gas to reduce beam scattering in high vapour pressure scanning electron microscopy applications. Scanning 20:57-60).
22. Suzuki, S., Kawata, S. and Hara, K. 1995. U.S. #5,396,067: Scan type electron microscope, Nikon Corporation (Tokyo, JP).
23. Thiel, B. L., Bache, I. C. Fletcher, A. L., Meredith P., and Donald, A. 1997. An improved model for gaseous amplification in the environmental SEM. Journal of Microscopy (Oxford) 187(3): 143-157.
24. Thiel, B. L., Bache I. C. and Smith, P. 2000. Imaging the Probe Skirt in the Environmental SEM. Microscopy and Microanalysis 6(2): 794-795.
25. Wight, S. 2000. Experimental data and model simulations of beam spreas in the environmental scanning electron microscope. Scanning 23:320-327.
26. Wight, S. and Zeissler, C. 1999. Direct measurement of electron beam scattering in the environmental scanning electron microscope using phosphor imaging plates. Scanning 22:167-172.
27. Wight, S. and Zeissler, C. 2000. Phosphor imaging plate measurement of electron scattering in the environmental scanning electron microscope. Microscopy and Microanalysis 6(2): 798-799.
28. Wight, S., Gillen, G, and Herne, T. 1997. Development of environmental scanning electron microscopy electron beam profile imaging with self-assembled monolayers and secondary ion mass spectroscopy. Scanning 19(2): 71-4.