Electron energy-loss spectroscopy analysis of the electronic structure of nitrided Hf silicate films

Applied Physics Letters

Volumn 84, Issue 18, 2004, Pages 3672-3674

  Ikarashi, Nobuyuki ^a   Miyamura, Makoto ^a   Masuzaki, Koji ^a   Tatsumi, Toru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONVOLUTION; CRYSTAL LATTICES; DIELECTRIC FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; ENERGY DISSIPATION; MOSFET DEVICES; SEMICONDUCTING FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DENSITY OF STATES (DOS); ENERGY-LOSS FUNCTION (ELF); X-RAY PHOTOEMISSION SPECTROSCOPY; ZERO-LOSS PEAK;

HAFNIUM COMPOUNDS;

EID: 2542443543     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1738948     Document Type: Article

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