Complementary dipole exposure solutions at 0.29 k1

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 327-338

  Hendrickx, Eric ^a,b   Torres, Andres ^c   Lafferty, Neal ^c   Cam, Laurent Le ^d   Johnson, Stephen ^a,b   Reita, Carlo ^e   Vandenberghe, Geert ^a,b   Maurer, Wilhelm ^f  

^a IMEC   (Belgium)

^b CMOS Device Research Group   (Belgium)

^c MENTOR GRAPHICS CORPORATION   (United States)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

^e Photronics   (France)

^f INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

ArF lithography; Dipole illumination; Double exposure

Indexed keywords

ARF LITHOGRAPHY; COMPLEMENTARY DIPOLE EXPOSURE (CDE); DIPOLE ILLUMINATION; DOUBLE EXPOSURE;

DATA REDUCTION; IMAGING TECHNIQUES; LIGHT POLARIZATION; MASKS; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; STATIC RANDOM ACCESS STORAGE;

OPTICAL SYSTEMS;

EID: 25144483793     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600843     Document Type: Conference Paper

References (9)

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