Advanced layout fragmentation and simulation schemes for model based OPCC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 1159-1168

  Word, James ^a   Torres, Andes ^a   Lacour, Pat ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Double exposure; OPC; Phase shift; PSM; RET

Indexed keywords

DOUBLE EXPOSURE; OPTICAL PROXIMITY CORRECTION (OPC); PSM; RET;

COMPUTER SOFTWARE; ERROR DETECTION; IMAGE ANALYSIS; MASKS; MATHEMATICAL MODELS; OPTICAL ENGINEERING; OPTIMIZATION; PHASE SHIFT; PROBLEM SOLVING;

OPTICAL SYSTEMS;

EID: 25144463917     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598848     Document Type: Conference Paper

References (14)

1. N. Cobb, A. Zakhor, "A mathematical and CAD framework for proximity correction", proc. SPIE vol. 2726, pp. 208-222, 1996.
2. Y. Granik, N. Cobb, T. Do, "Universal Process Modeling with VTRE for OPC", proc. SPIE vol. 4691, pp. 377-394, 2002.
3. N. Cobb, Y. Granik, "Model-based OPC using the MEEF matrix", proc. SPIE vol. 4889, pp. 1281-1292, 2002.
4. J. Word, N. Cobb "Enhanced Model Based OPC for 65nm and Below", proc. SPIE vol. 5567, pp. 1305-1314, 2004.
5. C.M. Lai et. al., "Phenomena and OPC Solution of Ripple Patterns for 65nm Node", proc. SPIE vol. 5377, pp. 1165-1171, (2004.)
6. K. Lucas et. al., "Model-base design improvements for the 100um lithography generation", proc. SPIE vol. 4691, pp. 215-226, (2003)
7. M. Eurlings, E van Setter, et.al. "0.11um Imaging in KrF lithography using dipole illumination", Proc. SPIE V. 4404, p. p.266 (2001)
8. J.A. Torres, F. Schellenberg, O. Toublan "Model-assisted double dipole decomposition" proc. SPIE vol. 4691 pp. 407-417, (2002)
9. S.D. Hsu, J.F. Chen, et.al "65-nm full-chip implementation using double dipole lithography" proc. SPIE vol. 5040, pp. 215, (2003)
10. M. Levenson et. al., "Improving resolution in photolithography with a phase shifting mask, "IEEE, ED-29, p. 1828, (1982)
11. L. Liebmann et. al,. "Enabling the 70nm Technology Node with 193nm altPSM Lithography," proc. SPIE vol 4692, pp. 262-273 (2002).
12. Kenny K.H. Toh, et. al "Chromeless Phase-Shifted Masks: A New Approach to Phase Shifting Masks", proc. SPIE vol. 1496, pp. 27-53, (1990)
13. John S. Petersen, et. al. "Development of a Sub-100nm Integrated Imaging System Using Chromeless Phase-Shifting Imaging with Very High NA KrF Exposure and Off-axis Illumination", proc. SPIE, vol.4692, pp 298-311, (2002)
14. Andres Torres, Wilhelm Maurer "Alternatives to Alternating Phase Shift Masks for 65nm", proc SPIE, vol 4889, pp 540-550, (2002)