Model-based OPC using the MEEF matrix

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1281-1292

  Cobb, Nick ^a   Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

AltPSM; CPL; Dipole; MEEF; OPC

Indexed keywords

EDGE DETECTION; ERROR CORRECTION; LEAST SQUARES APPROXIMATIONS; PHOTOLITHOGRAPHY; WSI CIRCUITS;

OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0038302994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467435     Document Type: Conference Paper

References (6)

1. Y. Granik, "Generalized MEEF theory", Interface 2001.
2. Y. Granik, N. Cobb, "MEEF as a matrix", BACUS 2001, Proc. SPIE Vol. 4562, p. 980-991, 2002.
3. N. Cobb, A. Zakhor, "Fast Sparse Aerial Image Calculation for OPC", BACUS 1994, Proc. SPIE Vol. 2621, p. 534-545, 1995.
4. Y. Granik, N. Cobb, "Two-dimensional G-MEEF Theory and Applications", Photomask Japan, Proc. SPIE Vol. 4754, p. 146-155, 2002.
5. Spence, et al. "Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers", BACUS 1999, Proc. SPIE Vol. 3873, p. 277-287.
6. C. Chen, et. al, "Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments", SPIE Optical Microlithography, Proc. SPIE Vol. 4691, p. 247-258, 2002.