Calibration of OPC models for multiple focus conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 691-702

  Schacht, Jochen ^a   Herold, Klaus ^a   Zimmermann, Rainer ^a   Torres, J Andres ^b,d   Maurer, Wilhelm ^b   Granik, Yuri ^b   Chang, Ching Hsu ^c   Hung, G Kuei Chun ^c   Lin, Benjamin Szu Min ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b MENTOR GRAPHICS CORPORATION   (United States)

^c UNITED MICROELECTRONICS CORPORATION   (Taiwan)

^d NONE   (United States)

Author keywords

DOF; Low k1 imaging; Micro lithography; Model Based OPC; Modeling; Process Window; Scattering Bars

Indexed keywords

APPROXIMATION THEORY; COMPUTER HARDWARE; DATA REDUCTION; DEGREES OF FREEDOM (MECHANICS); MATHEMATICAL MODELS; MEASUREMENTS; PHOTOLITHOGRAPHY; VECTORS;

LOW K1 IMAGING; MICRO-LITHOGRAPHY; MODEL BASED OPC; PROCESS WINDOWS; SCATTERING BARS;

OPTICAL SYSTEMS;

EID: 3843081721     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534123     Document Type: Conference Paper

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