Nanowell-array surfaces prepared by argon plasma etching through a nanopore alumina mask

Langmuir

Volumn 21, Issue 18, 2005, Pages 8429-8438

  Kang, Myungchan ^a   Yu, Shufang ^a   Li, Naichao ^a   Martin, Charles R ^a  

^a University of Florida ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; ARGON PLASMA ETCHING; LATEX NANOPARTICLES; NANOWELL-ARRAY SURFACES;

ALUMINA; ARGON; ATOMIC FORCE MICROSCOPY; FRICTION; NANOSTRUCTURED MATERIALS; PLASMA ETCHING; THIN FILMS;

SURFACES;

ALUMINUM OXIDE; ARGON; ELECTROLYTE; NANOMATERIAL; POLYSTYRENE DERIVATIVE; SILANE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; SCANNING ELECTRON MICROSCOPY;

ALUMINUM OXIDE; ARGON; ELECTROLYTES; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; POLYSTYRENES; SILANES;

EID: 24944501238     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la050146h     Document Type: Article

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