FTIR study of fluorinated silicon oxide film

Journal of Physics D: Applied Physics

Volumn 30, Issue 12, 1997, Pages 1720-1724

  Kim, Bog Gi ^a   Kang, Seung Youl ^b   Kim, Jong Jean ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR VIBRATIONS; PLASMA APPLICATIONS; SILICON COMPOUNDS;

ASYMMETRIC STRETCHING MODE; FLUORINATION;

SEMICONDUCTING FILMS;

EID: 0031166522     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/12/005     Document Type: Article

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