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Volumn 39, Issue 3 A, 2000, Pages 1392-1398

Analysis of deprotection reaction in chemically amplified resists using an fourier transform infrared spectrometer with an exposure tool

a Jpn (Japan)

Author keywords

Activation energy; Chemically amplified resist; Deprotection reaction; FT IR spectrometer; Lithography simulation; Protection groups

Indexed keywords

CHEMICAL BONDS; COMPUTER SIMULATION; DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; ORGANIC COMPOUNDS; POLYSTYRENES;

BUTOXYCARBONYL; CHEMICALLY AMPLIFIED RESISTS; DEPROTECTION GROUPS; DEPROTECTION REACTION; ETHOXYETHYL;

PHOTORESISTS;

EID: 0033749444 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.1392 Document Type: Article

Times cited : (24)

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