Study on nano imprint lithography by the pre-exposure process (PEP)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 912-925

  Kono, Yoshiyuki ^a   Sekiguchi, Atsushi ^a   Hirai, Yoshihiko ^b   Arasaki, Shigeo ^c   Hattori, Koichi ^a,b,c  

^a Jpn   (Japan)

^b Osaka Prefecture University   (Japan)

^c Pulsa   (Japan)

Author keywords

Crosslinking ratio; FT IR; Nano imprint; Pre exposure; UV cure

Indexed keywords

CROSSLINKING; CURING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT INTERFERENCE; NANOTECHNOLOGY; RESINS; THROUGHPUT; ULTRAVIOLET RADIATION; VISCOSITY;

CROSSLINKING RATIO; FT-IR; NANO IMPRINT; PRE-EXPOSURE; UV CURVE;

PHOTOLITHOGRAPHY;

EID: 24644432413     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598607     Document Type: Conference Paper

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