SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 84, Issue 15, 2004, Pages 2880-2882

Massively parallel, large-area maskless lithography

(2) Klosner, Marc a Jain, Kanti a

a Anvik Corporation (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM-PROCESSING SYSTEMS; MASKLESS LITHOGRAPHY; OPTICAL MODULES; SEAMLESS SCANNING SYSTEMS;

BANDWIDTH; COMPUTER HARDWARE; LIGHT MODULATION; LIGHT POLARIZATION; LIGHT REFLECTION; MASKS; MICROELECTROMECHANICAL DEVICES; OPTICAL BEAM SPLITTERS; OPTICAL RESOLVING POWER; SCANNING; SILICON WAFERS; SPECKLE;

PHOTOLITHOGRAPHY;

EID: 2342460360 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1699449 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.