Impact of graybeam method of virtual address reduction on image quality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 537-544

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Graybeam Address Grid; Image Quality; Raster Scan Imaging

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; IMAGE QUALITY; IMAGING SYSTEMS; NONLINEAR SYSTEMS;

RASTER SCAN IMAGING;

MASKS;

EID: 0035765981     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458331     Document Type: Conference Paper

References (4)

1. M.L. Rieger, J.A. Schoeffel, P.A. Warkentin, "Image Quality Enhancements for Raster Scan Lithography," Optical/Laser Microlithography, SPIE Vol. 922 (1988) pp. 55-64.
2. C.A. Mack, "Electron Beam Lithography Simulation for Mask Making, Part VI: Comparison of 10 and 50 kV GHOST Proximity Effect Correction," Photomask and X-Ray Mask Technology VIII, Proc., SPIE Vol. 4409 (2001) pp. 194-203.
3. C.A. Mack, "Using the Normalized Image Log-Slope," Microlithography World (February, 2001) pp. 23-24.
4. C.A. Mack, "Using the Normalized Image Log-Slope, part 2," Microlithography World (May, 2001) pp. 20-22.