Sub-100 nm nanostructuring of silicon by ultrashort laser pulses

Optics Express

Volumn 13, Issue 17, 2005, Pages 6651-6656

  Le Harzic, R ^a,b   Schuck, H ^a   Sauer, D ^a   Anhut, T ^a   Riemann, I ^a   Konig K ^a  

^a FRAUNHOFER INSTITUTE FOR BIOMEDICAL ENGINEERING   (Germany)

^b JENLAB GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LASER APPLICATIONS; LASER BEAM EFFECTS; SILICON; ULTRASHORT PULSES;

LASER SCANNING MICROSCOPES; NANOPROCESSING; NANOSTRUCTURING;

NANOSTRUCTURED MATERIALS;

EID: 24144434937     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.006651     Document Type: Review

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