Formation of cobalt silicides as a buried layer in silicon using high energy heavy ion irradiation

Journal of Physics D: Applied Physics

Volumn 38, Issue 16, 2005, Pages 2836-2840

  Chakraborty, B R ^a   Halder, S K ^a   Karar, N ^a   Kabiraj, D ^b   Avasthi, D K ^b  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARGE CARRIERS; ELECTRON BEAMS; EVAPORATION; HEAVY IONS; MULTILAYERS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY;

COBALT SILICIDES; ION IRRADIATION; PHASE FORMATION; ROOM TEMPERATURE;

COPPER COMPOUNDS;

EID: 23844555789     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/16/015     Document Type: Article

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