Swift heavy ion induced modification of the Co/Si interface; cobalt silicide formation

Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 59-63

  Bhattacharya, D ^a   Srivastava, S K ^a   Sahoo, P K ^b   Principi, G ^c   Kabiraj, D ^a   Som, T ^d   Kulkarni, V N ^b   Avasthi, D K ^a  

^a INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c UNIVERSITY OF PADOVA   (Italy)

^d INSTITUTE OF PHYSICS   (India)

Author keywords

Defects; Diffusion; Metal silicide; Rutherford backscattering spectroscopy

Indexed keywords

ANNEALING; COBALT COMPOUNDS; ELECTRON BEAMS; HEAVY IONS; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); SILICATES; SPECTROSCOPY; THERMODYNAMICS; X RAY DIFFRACTION;

DEFECT MEDIATED ATOMIC MOBILITY;

COATING TECHNIQUES;

FILM;

EID: 14144256496     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00216-5     Document Type: Article

References (29)