Silicide formation in cobalt/amorphous silicon, amorphous Co-Si and bias-induced Co-Si films

Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 31-39

  Shim, Jae Yeob ^a   Park, Sang Wook ^a   Baik, Hong Koo ^a  

^a Yonsei University   (South Korea)

Author keywords

Cobalt; Crystallization; Phase transitions; Silicides

Indexed keywords

AMORPHOUS FILMS; CALCULATIONS; COBALT COMPOUNDS; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; EPITAXIAL GROWTH; ION BOMBARDMENT; IONS; PHASE TRANSITIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

COBALT SILICIDE; HEAT OF FORMATION;

THIN FILMS;

EID: 0031553502     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08929-8     Document Type: Article

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