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Volumn 27, Issue 4, 2005, Pages 433-438

Silicon micro-probe card using porous silicon micromachining technology

Author keywords

Contact resistance; Porous silicon micromachining; Probe beam; Silicon probe card

Indexed keywords

ANNEALING; CANTILEVER BEAMS; DRY ETCHING; ELECTRIC RESISTANCE; INTEGRATED CIRCUITS; MICROMACHINING; THERMAL EXPANSION;

EID: 23844494859     PISSN: 12256463     EISSN: None     Source Type: Journal    
DOI: 10.4218/etrij.05.0104.0080     Document Type: Article
Times cited : (17)

References (13)
  • 3
    • 0032315775 scopus 로고    scopus 로고
    • P4 probe card - A solution for at-speed, high density, wafer probing
    • Rajiv Pandey and Dan Higgins, "P4 Probe Card-A Solution for at-Speed, High Density, Wafer Probing," IEEE ITC' 98, 1998, pp. 836-842.
    • (1998) IEEE ITC' 98 , pp. 836-842
    • Pandey, R.1    Higgins, D.2
  • 10
    • 1542303703 scopus 로고    scopus 로고
    • Characteristics of cantilever beam fabricated by porous silicon micromachining for flow sensor application
    • Y.M. Kim, C.T. Seo, D.S. Eun, S.G., Park, C.S. Jo, and J.H. Lee, "Characteristics of Cantilever Beam Fabricated by Porous Silicon Micromachining for Flow Sensor Application," Proc. IEEE Int'l Conf. SENSORS 2003, 2003, pp. 642-646.
    • (2003) Proc. IEEE Int'l Conf. SENSORS 2003 , pp. 642-646
    • Kim, Y.M.1    Seo, C.T.2    Eun, D.S.3    Park, S.G.4    Jo, C.S.5    Lee, J.H.6
  • 11
    • 0347806137 scopus 로고    scopus 로고
    • Fabrication of a silicon micro-probe for vertical probe card application
    • Y.D. Kim, J.H. Sim, J.W. Nam, and J.H. Lee, "Fabrication of a Silicon Micro-Probe for Vertical Probe Card Application," Jpn. J. Appl. Phys., vol. 37, 1998, pp. 7070-7073.
    • (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 7070-7073
    • Kim, Y.D.1    Sim, J.H.2    Nam, J.W.3    Lee, J.H.4
  • 12
  • 13
    • 4043181922 scopus 로고    scopus 로고
    • Characterization of oxidized porous silicon layer by complex process using RTO and the fabrication of CPW-type stubs on an OPSL for RF application
    • Aug.
    • J.Y. Park and J.H. Lee, "Characterization of Oxidized Porous Silicon Layer by Complex Process Using RTO and the Fabrication of CPW-Type Stubs on an OPSL for RF Application," ETRI J., vol. 26, no. 4, Aug. 2004, pp. 315-320.
    • (2004) ETRI J. , vol.26 , Issue.4 , pp. 315-320
    • Park, J.Y.1    Lee, J.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.