Characteristics of Cantilever Beam Fabricated by Porous Silicon Micromachining for Flow Sensor Application

Proceedings of IEEE Sensors

Volumn 2, Issue 1, 2003, Pages 642-646

  Kim, Young Min ^a   Seo, Chang Taeg ^a   Eun, Duk Soo ^a   Park, Sung Gen ^c   Jo, Chan Seop ^c   Lee, Jong Hyun ^b  

^a Kyungpook National University   (South Korea)

^b Grenoble INP Phelma   (France)

^c NONE

Author keywords

Cantilever Beam; Micro flow sensor; Porous silicon Micromachining; Thermal stress

Indexed keywords

ANNEALING; DIFFERENTIAL AMPLIFIERS; MICROMACHINING; PIEZOELECTRIC DEVICES; POROUS SILICON; REACTIVE ION ETCHING; RESISTORS; SENSORS; SILICON WAFERS; SURFACE TENSION; THERMAL EXPANSION; THERMAL STRESS; THIN FILMS;

EPITAXIAL LAYERS; MICRO FLOW SENSORS; PIEZORESISTORS;

CANTILEVER BEAMS;

EID: 1542303703     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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