Field emission characteristics of ruthenium dioxide nanorods

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1885-1891

  Hsieh, C S ^a   Wang, G ^a   Tsai, D S ^a   Chen, R S ^a   Huang, Y S ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BONDING; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC FIELDS; HEAT TREATMENT; NANOSTRUCTURED MATERIALS; THERMODYNAMIC STABILITY; THRESHOLD VOLTAGE;

CURRENT EMISSION; NANOROD FILMS; RUTHENIUM DIOXIDE; THERMAL ANNEALING;

RUTHENIUM COMPOUNDS;

EID: 23444442850     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/078     Document Type: Review

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