Fabrication and characterization of silicon carbide field-emitter array

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 106-110

  Van Zuuk, A ^a   Heerkens, C Th H ^a   Van Veen, A H V ^a   Teepen, T F ^a   Wieland, M J ^a   Groening, O ^b   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Silicon carbide field emitter tip array

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ETCHING; NITROGEN; OXIDATION; POLYMETHYL METHACRYLATES; SCANNING;

EMISSION CURRENTS; FIELD EMISSION ARRAYS (FEA); SHIELDING EFFECTS; SILICON CARBIDE FIELD EMITTER TIP ARRAYS;

SILICON CARBIDE;

EID: 17344390821     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00081-4     Document Type: Conference Paper

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