Area-selective growth of ruthenium dioxide nanorods on LiNbO 3(100) and Zn/Si substrates

Journal of Materials Chemistry

Volumn 14, Issue 24, 2004, Pages 3503-3508

  Wang, Ginny ^a   Hsieh, Chih Sung ^a   Tsai, Dah Shyang ^a   Chen, Reui San ^a   Huang, Ying Sheng ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LITHIUM NIOBATE; NANOSTRUCTURED MATERIALS; ORGANOMETALLICS; SILICA; SILICON; ZINC;

AREA-SELECTIVE GROWTH; DEPOSITION FLUX; NANORODS; NUMBER DENSITY;

RUTHENIUM COMPOUNDS;

LITHIUM DERIVATIVE; METAL OXIDE; NIOBIUM; RUTHENIUM DERIVATIVE; RUTHENIUM DIOXIDE; SILICON; UNCLASSIFIED DRUG; ZINC;

ARTICLE; CRYSTAL; GROWTH; IMAGE ANALYSIS; NANOROD; TRANSMISSION ELECTRON MICROSCOPY; VAPOR; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 10844278248     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b409283j     Document Type: Article

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