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Volumn 413, Issue 1-2, 2002, Pages 85-91

Preparation and characterization of RuO2 thin films from Ru(CO)2(tmhd)2 by metalorganic chemical vapor deposition

(4) Chen, Reui San a Huang, Ying Sheng a Chen, Yao Lun b Chi, Yun b

a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

b NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

Chemical vapor deposition; Raman scattering; Resistivity; Ruthenium dioxide; Scanning electron microscopy; Thin film; X ray diffraction

Indexed keywords

ANNEALING; CHARACTERIZATION; CONDUCTIVE FILMS; ELECTRIC RESISTANCE; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; RAMAN SCATTERING; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS; SURFACES; X RAY DIFFRACTION ANALYSIS;

REACTIVE SPUTTERING;

THIN FILMS;

EID: 0037166482 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00343-7 Document Type: Article

Times cited : (25)

References (25)

1
- 0024607974
- (1989) Thin Solid Films , vol.169 , pp. 17
- Krusin-Elbaum, L.¹

2
- 0024092120
- (1988) J. Electrochem. Soc. , vol.135 , pp. 2610
- Krusin-Elbaum, L.¹ Wittmer, M.²

3
- 21544479801
- (1987) Appl. Phys. Lett. , vol.50 , pp. 854
- Kolawa, E.¹ So, F.C.T.² Pan, E.T.S.³ Nicolet, M.A.⁴

4
- 0000327597
- (1988) J. Phys. D , vol.22 , pp. 1766
- Khanna, P.K.¹ Bhatnagar, S.K.² Sisodia, M.L.³

5
- 0024737477
- (1989) Sensors Actuators , vol.19 , pp. 401
- Prudenziati, M.¹ Morten, B.² Cilloni, F.³ Ruffi, G.⁴

6
- 0024087443
- (1988) J. Mater. Sci. , vol.23 , pp. 3151
- Dziedzic, A.¹ Golonka, L.²

7
- 0001190364
- (1990) Appl. Phys. Lett. , vol.57 , pp. 304
- Jia, Q.X.¹ Anderson, W.A.²

8
- 0001125067
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1318
- Norga, G.J.¹ Fe, L.² Wouters, D.J.³ Maes, H.E.⁴

9
- 0022162031
- (1985) J. Electrochem. Soc. , vol.132 , pp. 2677
- Green, M.L.¹ Gross, M.E.² Papa, L.E.³ Schnoes, K.J.⁴ Brasen, D.⁵

10
- 0033284426
- (1999) Electrochem. Solid State Lett. , vol.2 , pp. 622
- Lee, J.H.¹ Kim, J.Y.² Rhee, S.W.³

11
- 0030259191
- (1996) Thin Solid Films , vol.287 , pp. 74
- Liao, P.C.¹ Mar, S.Y.² Ho, W.S.³ Huang, Y.S.⁴ Tiong, K.K.⁵

12
- 0000320490
- (1993) J. Electrochem. Soc. , vol.140 , pp. 834
- Sakiyama, K.¹ Onishi, S.² Lshihara, K.³ Orita, K.⁴ Kajiyama, T.⁵ Hosoda, N.⁶ Hara, T.⁷

13
- 0034285310
- (2000) J. Mater. Res. , vol.15 , pp. 1955
- Kang, T.S.¹ Kim, Y.S.² Je, J.H.³

14
- 0032162370
- (1998) Solar Energy Mater. Solar Cells , vol.55 , pp. 179
- Huang, Y.S.¹ Liao, P.C.²

15
- 0031186555
- (1997) J. Mater. Res. , vol.12 , pp. 1844
- Gao, Y.¹ Bai, G.² Liang, Y.³ Dunham, G.C.⁴ Chambers, S.A.⁵

16
- 0000359098
- (1995) Appl. Phys. Lett. , vol.67 , pp. 1677
- Jia, Q.X.¹ Wu, X.D.² Foltyn, S.R.³ Findikoglu, A.T.⁴ Tiwari, P.⁵ Zheng, J.P.⁶ Jow, T.R.⁷

17
- 0001287460
- (2001) J. Appl. Phys. , vol.89 , pp. 2987
- Bhaskar, S.¹ Dobal, P.S.² Majumder, S.B.³ Katiyar, R.S.⁴

18
- 0002598478
- (2001) Chem. Vap. Deposition , vol.7 , pp. 99
- Lee, F.J.¹ Chi, Y.² Liu, C.S.³ Hsu, P.F.⁴ Chou, T.Y.⁵ Peng, S.M.⁶ Lee, G.H.⁷

19
- 0000031092
- (1981) Phys. Rev. B , vol.24 , pp. 7342
- Goel, A.K.¹ Skotinko, G.² Pollak, F.H.³

20
- 0018546422
- (1979) J. Electrochem. Soc. , vol.126 , pp. 2017
- Vadimsky, R.G.¹ Frankenthal, R.P.² Thompson, D.E.³

21
- 0032142215
- (1998) J. Mater. Res. , vol.13 , pp. 2281
- Vetrone, J.¹ Foster, C.M.² Bai, G.R.³ Wang, A.⁴ Patel, J.⁵ Wu, X.⁶

22
- 0028194521
- (1994) Thin Solid Films , vol.238 , pp. 158
- Mar, S.Y.¹ Liang, J.S.² Sun, C.Y.³ Huang, Y.S.⁴

23
- 25944438622
- (1970) Phys. Rev. B , vol.15 , pp. 1382
- Mayadas, A.F.¹ Shatzkes, M.²

24
- 0020179418
- (1982) Solid State Comm. , vol.43 , pp. 921
- Huang, Y.S.¹ Pollak, F.H.²

25
- 0000597753
- (1995) Appl. Surf. Sci. , vol.90 , pp. 497
- Mar, S.Y.¹ Chen, C.S.² Huang, Y.S.³ Tiong, K.K.⁴

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