Piezoresistive microcantilevers for in situ stress measurements during thin film deposition

Review of Scientific Instruments

Volumn 76, Issue 7, 2005, Pages

  Seel, Steven C ^a,b   Thompson, Carl V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; MICROCANTILEVERS; PIEZORESISTIVITY; THIN FILM DEPOSITION;

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; PIEZOELECTRIC DEVICES; RESISTORS; SIGNAL TO NOISE RATIO; STRESS ANALYSIS; SUBSTRATES; THERMAL EXPANSION; THERMAL STRESS; THIN FILMS;

CANTILEVER BEAMS;

EID: 22944477370     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1947067     Document Type: Article

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