Influence of substrate temperature on the deposition of μc-Si:H thin film fabricated with VHF-PECVD and its structural properties

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 16, Issue 6, 2005, Pages 646-649

  Yang, Hui Dong ^a  

^a JINAN UNIVERSITY   (China)

Author keywords

C Si:H thin films; Optical emission spectroscopy; SiH4 plasma; Very high frequency plasma enhanced chemical vapor deposition (VHF PECVD)

Indexed keywords

EMISSION SPECTROSCOPY; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; THERMAL EFFECTS; VOLUME FRACTION;

DEPOSITION RATE; OPTICAL EMISSION SPECTROSCOPY (OES); SI:H THIN FILM; SUBSTRATE TEMPERATURE EFFECT;

THIN FILMS;

EID: 22944467543     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

1. Shah A, Meier J, Vallat-Sauvain E, et al. Microcrystalline silicon and micromorph tandem solar cells[J]. Thin Solid Films, 2002, 403-404: 179-187.
2. MAI Yao-hua, LI Hong-bo, XUE Jun-ming, et al. A new model for light trapping scheme of a-Si solar cell and its optimization[J]. Journal of Optoelectronics · Laser, 2001, 12(12): 1222-1225. (in Chinese)
3. Goerlitzer M, Torres P, Beck N, et al. Structural properties and electronic transport in intrinsic microcrystalline silicon deposition by VHF-GD technique[J]. J Non-Cryst Solids, 1998, 227-230: 996-1000.
4. Hapke P, Finger F. High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processes[J]. J of Non-Cryst Solids, 1998, 227-230: 861-865.
5. Yang H D, Wu C Y, Mai Y H, et al. Fabrication of hydrogenated microcrystalline silicon thin films at low temperature by VHF-PECVD[J]. Chinese Journal of Semiconductors, 2002, 23(9): 902-908.
6. Yang H D, Wu C Y, Mai Y H, et al. High growth-rate deposition of μc-Si:H thin film at low temperature with VHF-PECVD[J]. Int J Mod Phys B, 2002, 16(28,29): 4259-4262.
7. Mai Y, Klein S, Geng X, et al. Structure adjustment during high-deposition-rate growth of microcrystalline silicon solar cells[J]. Appl Phys Lett, 2004, 85(14): 2839-2841.
8. 4 plasma[J]. Journal of Optoelectronics · Laser, 2003, 14(4): 375-379. (in Chinese)
9. YANG Hui-dong, WU Chun-ya, LI Hong-bo, et al. Diagnosis of VHF plasma with optical emission spectroscopy[J]. Acta Physica Sinica, 2003, 52(9): 2324-2330. (in Chinese)
10. YANG Hui-dong, WU Chun-ya, HUANG Jun-kai, et al. Optical emission spectroscopy (OES) investigation on VHF plasma and its glow discharge mechanism during the μc-Si:H film deposition[J]. Thin Solid Films, 2005, 472(1-2): 125-129.
11. Fukuda Y, Sakuma Y, Fukai C, et al. Optical emission spectroscopy study toward high rate growth of microcrystalline silicon[J]. Thin Solid Films, 2001, 386: 256-260.
12. 4 glow discharge, and temperature dependence of hydrogenated amorphous silicon deposition rate[J]. J Appl Phys, 1993, 73(5): 2578-2580.