Dynamic characterization of silicon-based microstructure of high aspect ratio by dual-prism UV laser system

Sensors and Actuators, A: Physical

Volumn 122, Issue 1 SPEC. ISS., 2005, Pages 45-54

  Pan, C T ^a   Hwang, Y M ^a   Hsieh, C W ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

355 nm laser; Dynamic characteristics; Microstructure; Silicon based; UV Nd:YAG

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; COMPUTER SOFTWARE; CRYSTAL ORIENTATION; FINITE ELEMENT METHOD; MICROELECTROMECHANICAL DEVICES; MOLECULAR VIBRATIONS; NEODYMIUM LASERS; OPTICAL SYSTEMS; PRISMS; SILICON; ULTRAVIOLET RADIATION;

355 NM LASER; DYNAMIC CHARACTERISTICS; SILICON-BASED MICROSTRUCTURE; UV ND:YAG;

MICROSTRUCTURE;

EID: 22844451741     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2005.04.015     Document Type: Article

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