MEMS resonators that are robust to process-induced feature width variations

Journal of Microelectromechanical Systems

Volumn 11, Issue 5, 2002, Pages 505-511

  Liu, Rong ^b   Paden, Brad ^a,b   Turner, Kimberly ^a,b  

^a IEEE

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Frequency stability; MEMS resonator; Process variation

Indexed keywords

FREQUENCY STABILITY; MICROMACHINING; RESONATORS; SENSITIVITY ANALYSIS;

FREQUENCY SENSITIVITY; LATERALLY VIBRATING RESONATOR; PROCESS VARIATION;

MICROELECTROMECHANICAL DEVICES;

EID: 0036773371     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.803279     Document Type: Article

References (12)

1. W. C. Tang, M. G. Lim, and R. T. Howe, "Electrostatic comb drive levitation and control method," J. Microelectromech. Syst., vol. 1, no. 4, pp. 170-178, Dec. 1992.
2. Y. Mochida, M. Tamura, and K. Ohwada, "A micromachined vibrating rate gyroscope with independent beams for the Drive and detection modes," in Tech. Dig. IEEE Int. Conf. MEMS'99, 1999, pp. 618-623.
3. L. A. Yeh, H. Jiang, and N. C. Tien, "Integrated polysilicon and DRIE bulk silicon micromachining for an electrostatic torsional actuator," J. Microelectromech. Syst., vol. 8, no. 4, pp. 456-465, Dec. 1999.
4. M. J. Daneman, N. C. Tien, O. Solgaard, A. P. Pisano, K. Y. Lau, and R. S. Muller, "Linear microvibromotor for positioning optical components," J. Microelectromech. Syst., vol. 5, no. 3, pp. 159-165, Sept. 1996.
5. L. A. Romero, F. M. Dickey, and S. C. Holswade, "A method for achieving constant rotation rates in a microorthoginal linkage system," J. Microelectromech. Syst., vol. 9, no. 2, pp. 236-244, June 2000.
6. H. J. De Los Santos, Introduction to Microelectromechanical (MEM) Microwave System. Dedham, MA: Artech House, 1999.
7. Y. K. Yong and J. R. Vig, "Resonator surface contamination-A cause of frequency fluctuation?," IEEE Trans. Ultrason., Ferroelectr., Freq. Contr., vol. 36, no. 4, pp. 452-458, July 1989.
8. T. B. Gabrielson, "Mechanical-Thermal noise in micromachined acoustic and vibration sensors," IEEE Trans. Electron Devices, vol. 40, no. 5, pp. 903-909, May 1993.
9. F. E. H. Tay, J. Xu, Y. C. Liang, V. J. Logeeswaran, and Y. F. Yao, "The effects of nonparallel plates in a differential capacitive microaccelerometer," J. Micromech. Microeng., vol. 9, pp. 283-293, 1999.
10. Y. S. Hong, J. H. Lee, and S. H. Kim, "A laterally driven symmetric micro-resonator for gyroscopic applications," J. Micromech. Microeng., vol. 10, pp. 452-458, 2000.
11. J. B. Starr, "Squeeze-film damping in solid-state accelerometers," in Solid-State Sensor and Actuator Workshop, Tech. Dig., New York, 1990, pp. 44-47.
12. K. A. Shaw, Z. L. Zhang, and N. C. MacDonald, "SCREAM-I, a single-mask single-crystal silicon, reactive ion etching process for microelectromechanical structures," Sens. Actuators, Phys. A, vol. 40, p. 63, 1994.