Constrained layer damping treatments for microstructures

Journal of Vibration and Acoustics, Transactions of the ASME

Volumn 124, Issue 4, 2002, Pages 612-616

  Hsu, Yi Chu ^a   Shen, I Y ^a  

^a University of Washington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FINITE ELEMENT METHOD; MICROMACHINING; MICROSTRUCTURE; PHOTORESISTS; SILICON; SPECTRUM ANALYSIS; VISCOELASTICITY;

DAMPING TREATMENTS; DOPPLER VIBROMETER; MICRO-STRAINED LAYER TREATMENTS; SILICON BEAMS; VISCOELASTIC PHOTORESIST LAYER;

DAMPING;

EID: 0036773668     PISSN: 10489002     EISSN: 15288927     Source Type: Journal    
DOI: 10.1115/1.1500743     Document Type: Article

References (13)

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