Multilayer resist films applicable to nanopatterning of insulating substrates based on current-injecting scanning probe lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 4, 1999, Pages 1605-1608

  Sugimura, Hiroyuki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644448532     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590798     Document Type: Article

References (25)

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