Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor

Acta Materialia

Volumn 49, Issue 4, 2001, Pages 583-588

  Krumdieck, S ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIZATION; FILM GROWTH; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PYROLYSIS; REACTION KINETICS; SATURATION (MATERIALS COMPOSITION); ULTRASONIC APPLICATIONS; VAPORS;

ULTRASONIC ATOMIZATION;

TITANIUM COMPOUNDS;

EID: 0035089299     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(00)00356-6     Document Type: Article

References (12)

1. Jensen K.F. Hitchman M.L., Jensen K.F. Chemical Vapor Deposition Principles and Applications. 1993;Academic Press, London.
2. Kelkar A.S., Mahajan R.L., Sani R.L. Trans. ASME. 118:1996;814-821.
3. Akiyama Y., Sato T., Imaishi N. J. Crystal Growth. 147:1995;130-146.
4. Siefering K.L., Griffin G.L. J. Electrochem. Soc. 137(3):1990;1207-1208.
5. Fictorie C.P., Evans J.F., Gladfelter W.L. J. Vac. Sci. Technol. A. 12(4):1994;1108-1113.
6. Masi M., Zonca R., Carra S. J. Electrochem. Soc. 146(1):1999;103-110.
7. Jones A.C., Leedham T.J., Wright P.J., Crosbie M.J., Lane P.A., Williams D.J., Fleeting K.A., Otway D.J., O'Brien P. Chem. Vap. Deposition. 4:1998;46-49.
8. US Patent No. 5,451,260. CRF D-1394-Raj, et al. Sono-Tek Corp. Licensee, 1986.
9. Morosanu C.E. Thin Films by Chemical Vapor Deposition. 1990;Elsevier, Amsterdam.
10. Krumdieck S., Raj R. J. Am. Ceram. Soc. 82(6):1999;1605-1607.
11. Krumdieck, S. P., Dissertation, University of Colorado at Boulder, 1999.
12. Adamson A.W. Adsorption of Gases and Vapors on Solids in Physical Chemistry of Surfaces. 1982;Wiley, New York. (chapter XVI).