Study on polymer materials evaluation system for nano-imprint lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 543-549

  Sekiguchi, Atsushi ^a   Kono, Yoshiyuki ^a   Hirai, Yoshihiko ^b  

^a Jpn   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Crosslinking ratio; FT IR; Nano imprint; Pre exposure; QCM

Indexed keywords

EID: 22144450999     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.543     Document Type: Article

References (13)

1. S. Y. Chou, P. R. Kreauss and P. J. Renstom: Appl. Phys. Lett. 67, 3114 (1996).
2. P. R. krauss and S. Y. Chou: J. Vac. Sci. Technol. B13, 2850 (1995).
3. S. Y. Chou, P. R. Krauss, W. L. Guo and L. Zhuang: J. Vac. Sci. Technol. B15 2897 (1997).
4. L. Guo, P. R. Krauss and S. Y. Chou: Appl. Phys. Lett. 17, 1881 (1997).
5. Y. Kurashima, et al., Jpn. J. Appl. Phys. 42, 3871 (2003).
6. Y. Hirai, T. Konishi, T. Yoshikawa, and S. Yoshida: J. Vac. Sci. Technol. B22, 3288 (2004).
7. T. Bailey, B. J. Choi, M. Colburn, M. Meissi, S. Shaya, J. G.Ekerdt, S. V. Sreenivasan and C. G. Willson: J. Vac. Sci. Technol. B18, 3572 (2000).
8. M. Komuro, J. Taniguchi, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima and S. Matsui: Jpn. J. Appl. Phys. 39, 7075 (2000).
9. M. Colburn, T. Bailey, B. J. Choi, J. G.Ekerdt, S. V. Sreenivasan and C. G. Willson: Solid State Technol., 67 (2001).
10. Y. Hirai, H. Kikuta, and T. Sanou: J. Vac. Sci. Technol. B21, 2777 (2003).
11. A. Sekiguchi, Y. Miyake, and M. Isono: Jpn. J. Appl. Phys. 39 1392 (2000).
12. G. Sauerbrey, Z.f. Phys., 155, 206 (1959).
13. K.S. Van Dyke, Proc. I.R.E., 16, 742 (1928).