Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect

Journal of Applied Physics

Volumn 97, Issue 12, 2005, Pages

  Howling, A A ^a   Derendinger, L ^a   Sansonnens, L ^a   Schmidt, H ^a   Hollenstein, Ch ^a   Sakanaka, E ^b   Schmitt, J P M ^b  

^a EPFL   (Switzerland)

^b Unaxis Displays   (France)

Author keywords

[No Author keywords available]

Indexed keywords

PARALLEL PLATE REACTORS; PLASMA REACTORS; RADIO FREQUENCY (RF) REACTORS; TELEGRAPH EFFECTS;

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; DRY ETCHING; ELECTRIC POTENTIAL; ELECTRIC REACTORS; ELECTROMAGNETISM; GROUNDING ELECTRODES; PERTURBATION TECHNIQUES; PHOTOVOLTAIC CELLS; SILICON SOLAR CELLS; THIN FILMS;

PLASMA PROBES;

EID: 21644473743     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1940136     Document Type: Article

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