Nonuniform radio-frequency plasma potential due to edge asymmetry in large-area radio-frequency reactors

Journal of Applied Physics

Volumn 96, Issue 10, 2004, Pages 5429-5440

  Howling, A A ^a   Sansonnens, L ^a   Ballutaud, J ^a   Hollenstein, Ch ^a   Schmitt, J P M ^b  

^a EPFL   (Switzerland)

^b Unaxis Displays   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRIC REACTORS; ELECTRODES; FREQUENCIES; MATHEMATICAL MODELS; PERTURBATION TECHNIQUES; PLASMA SHEATHS; SUBSTRATES;

DIELECTRIC SUBSTRATES; PLASMA IMPEDENCE; PLASMA POTENTIALS; PLASMA RESISTIVITY;

PLASMA APPLICATIONS;

EID: 9944221601     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1803608     Document Type: Article

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