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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2817-2819

Deposition of amorphous and microcrystalline silicon using a graphite filament in the hot wire chemical vapor deposition technique

(2) Morrison, S a Madan, A a

a MVSystems Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; PHOTOCONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SECONDARY ION MASS SPECTROMETRY; SOLAR CELLS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

GRAPHITE FILAMENTS;

AMORPHOUS SILICON;

EID: 0035508686 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1405514 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.