Identification of relaxation and diffusion mechanisms in amorphous silicon

Physical Review Letters

Volumn 81, Issue 9, 1998, Pages 1865-1868

  Barkema, G T ^a   Mousseau, Normand ^b,c  

^a UTRECHT UNIVERSITY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c OHIO UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000508285     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.81.1865     Document Type: Article

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