Influence of vignetting on signal analysis of photocarrier radiometry of semiconductor wafers

Review of Scientific Instruments

Volumn 76, Issue 6, 2005, Pages

  Li, Bincheng ^a,b   Shaughnessy, Derrick ^b   Mandelis, Andreas ^b  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

^b DEPARTMENT OF MECHANICAL AND INDUSTRIAL ENGINEERING   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER DIFFUSION; PHOTOCARRIER RADIOMETRY (PCR); SIGNAL ANALYSIS; VIGNETTING EFFECT;

CHARGE CARRIERS; FREQUENCIES; LASER BEAM EFFECTS; MICROSCOPIC EXAMINATION; SIGNAL PROCESSING; SILICON WAFERS;

RADIOMETRY;

EID: 20644437520     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1921450     Document Type: Article

References (20)

1. A. Mandelis, A. Othonos, C. Christofides, and J. Boussey-Said, J. Appl. Phys. 80, 5332 (1996).
2. A. Salnick, A. Mandelis, and C. Jean, Appl. Phys. Lett. 69, 2522 (1996).
3. A. Salnick, A. Mandelis, H. Ruda, and C. Jean, J. Appl. Phys. 82, 1853 (1997).
4. T. Ikari, A. Salnick, and A. Mandelis, J. Appl. Phys. 85, 7392 (1999).
5. M. E. Rodríguez, A. Mandelis, G. Pan, J. A. García, V. Gorodokin, and Y. Raskin, J. Appl. Phys. 87, 8113 (2000).
6. D. Shaughnessy and A. Mandelis, J. Appl. Phys. 93, 5236 (2003).
7. D. Shaughnessy and A. Mandelis, J. Appl. Phys. 93, 5244 (2003).
8. A. Mandelis, J. Batista, and D. Shaughnessy, Phys. Rev. B 67, 205208 (2003).
9. J. Batista, A. Mandelis, and D. Shaughnessy, Appl. Phys. Lett. 82, 4077 (2003).
10. B. Li, D. Shaughnessy, A. Mandelis, J. Batista, and J. Garcia, J. Appl. Phys. 96, 186 (2004).
11. J. F. Bisson and D. Fournier, J. Appl. Phys. 83, 1036 (1998).
12. J. F. Bisson and D. Fournier, J. Appl. Phys. 84, 38 (1998).
13. S. Paoloni and D. Fournier, J. Appl. Phys. 92, 5950 (2002).
14. S. Paoloni and D. Fournier, J. Appl. Phys. 92, 5955 (2002).
15. Visit www.ealingcatalog.com for details of the two reflective objectives. The catalog numbers for objectives 1 and 2 are 25-0522 and 25-0506, respectively.
16. Zemax® is an optical design software developed by the ZEMAX Development Corporation (San Diego, CA). Visit www.zemax.com for details about the product.
17. Handbook of Optical Constants of Solids, edited by, E. D. Palik, (Academic, San Diego, 1998), Vols. I and III.
18. D. Shaughnessy, B. Li, A. Mandelis, and J. Batista, Appl. Phys. Lett. 84, 5219 (2004).
19. B. Li, D. Shaughnessy, and A. Mandelis, J. Appl. Phys. 96, 186 (2004).
20. B. Li, D. Shaughnessy, and A. Mandelis, J. Appl. Phys. 97, 023701 (2005).