Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

Review of Scientific Instruments

Volumn 74, Issue 10, 2003, Pages 4549-4553

  Yamamura, Kazuya ^a   Yamauchi, Kazuto ^a   Mimura, Hidekazu ^a   Sano, Yasuhisa ^a   Saito, Akira ^a   Endo, Katsuyoshi ^a   Souvorov, Alexei ^b   Yabashi, Makina ^b   Tamasaku, Kenji ^c   Ishikawa, Tetsuya ^c   Mori, Yuzo ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c RIKEN   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; FABRICATION; MACHINING; PLASMAS; SYNCHROTRON RADIATION; VAPORIZATION; X RAYS;

ROTARY ELECTRODES;

MIRRORS;

EID: 0142167372     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1606531     Document Type: Article

References (6)

1. Y. Mori et al., Proc. SPIE 4501, 30 (2001).
2. Y. Mori, K. Yamamura, K. Yamauchi, T. Yoshii, K. Kataoka, K. Endo, K. Inagaki, and H. Kakiuchi, Nanotechnology 4, 225 (1993).
3. Y. Mon, K. Yamamura, and Y. Sano, Rev. Sci. Instrum. 71, 4620 (2000).
4. Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instrum. 71, 4627 (2000).
5. K. Yamauchi et al., Rev. Sci. Instrum. 74, 2894 (2003).
6. P. Kirkpatrick and A. V. Baez, J. Opt. Soc. Am. 38, 766 (1948).