The characterization of ZrO2 films with different substrate bias voltages

Journal of the Korean Physical Society

Volumn 46, Issue SUPPL., 2005, Pages

  Zhao, Sha ^a   Xu, Kewei ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Reactive magnetron sputtering; Substrate bias voltages; Thin solid film; Transmittance; ZrO2

Indexed keywords

EID: 20444454677     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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