Bias effects on structure of sputtered SiC films

Materials Science and Engineering: B

Volumn 85, Issue 1, 2001, Pages 25-27

  Wang, M ^a   Huang, A P ^a   Wang, B ^a   Yan, H ^a   Yao, Z Y ^b   Morimoto, A ^c   Shimizu, T ^c  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b CHINA INSTITUTE OF ATOMIC ENERGY   (China)

^c KANAZAWA UNIVERSITY   (Japan)

Author keywords

Bias assisted; SiC; Sputtering

Indexed keywords

ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; SYNTHESIS (CHEMICAL);

BIAS ASSISTED EFFECTS;

SEMICONDUCTING FILMS;

EID: 0035817433     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00621-3     Document Type: Article

References (7)