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Thin Solid Films

Volumn 293, Issue 1-2, 1997, Pages 67-74

Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target

(5) Tomaszewski, Henryk a Haemers, Johan b De Roo, Nico b Denul, Jurgen b De Gryse, Roger b

a Department of Micro and Nanotechnology of Wide Bandgap Semiconductors (Poland)

b GHENT UNIVERSITY (Belgium)

Author keywords

Growth mechanism; Oxides; Sputtering

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; GLASS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; THIN FILMS; YTTRIUM COMPOUNDS;

YTTRIA-STABILIZED ZIRCONIA;

ZIRCONIA;

EID: 0030648092 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09089-X Document Type: Article

Times cited : (22)

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