Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering

Applied Surface Science

Volumn 173, Issue 1-2, 2001, Pages 84-90

  Gao, Pengtao ^a   Meng, L J ^b   Dos Santos, M P ^a   Teixeira, V ^a   Andritschky, M ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL MICROSCOPY; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; X RAY CRYSTALLOGRAPHY; ZIRCONIA;

LOW PRESSURE REGION;

SURFACE CHEMISTRY;

EID: 0034830422     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00888-6     Document Type: Article

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