Surface analysis of the initial stages of Si film growth

Materials Science and Engineering: B

Volumn 108, Issue 3, 2004, Pages 281-285

  Xu, K ^a   Waite, M M ^b   Shah, S Ismat ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b WEST CHESTER UNIVERSITY   (United States)

Author keywords

Magnetron sputtering; Nucleation and growth; Polycrystalline silicon; XPS

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; MAGNETRON SPUTTERING; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; POLYSILICON; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROMETERS;

CRYSTALLINITY; INTERMIXING; NUCLEATION AND GROWTH; SILICON THIN FILMS;

FILM GROWTH;

EID: 2042437050     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.01.001     Document Type: Article

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