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Volumn 18, Issue 1, 1997, Pages 19-20

Novel fingerprint scanning arrays using polysilicon TFT's on glass and polymer substrates

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CAPACITANCE; CAPACITORS; ELECTRODES; SCANNING; SEMICONDUCTING GLASS; SEMICONDUCTING POLYMERS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SENSORS;

EID: 0030737361     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.553063     Document Type: Article
Times cited : (123)

References (7)
  • 3
    • 0030284578 scopus 로고    scopus 로고
    • The fabrication of EEPROM arrays on glass using a low temperature poly-Si TFT process' accepted for publication
    • Nov.
    • N. D. Young, G. Harkin, R. M. Bunn, D. J. McCulloch, and I. D. French, "The fabrication of EEPROM arrays on glass using a low temperature poly-Si TFT process' accepted for publication," IEEE Trans. Electron Devices, vol. 43, Nov. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43
    • Young, N.D.1    Harkin, G.2    Bunn, R.M.3    McCulloch, D.J.4    French, I.D.5
  • 5
    • 0001234336 scopus 로고
    • Beam shape effects with excimer laser crystallization of PECVD and LPCVD amorphous silicon
    • S. D. Brotherton, D. J. McCulloch, and M. J. Edwards, "Beam shape effects with excimer laser crystallization of PECVD and LPCVD amorphous silicon," Solid State Phenomena, vols. 37/38, p. 299, 1994.
    • (1994) Solid State Phenomena , vol.37-38 , pp. 299
    • Brotherton, S.D.1    McCulloch, D.J.2    Edwards, M.J.3
  • 7
    • 0024753175 scopus 로고
    • XeCl excimer laser annealing used to fabricate poly-Si TFT's
    • T. Sameshima, M. Hara, and S. Usui, "XeCl excimer laser annealing used to fabricate poly-Si TFT's," Jpn. J. Appl. Phys., vol. 28, p. 1789, 1989.
    • (1989) Jpn. J. Appl. Phys. , vol.28 , pp. 1789
    • Sameshima, T.1    Hara, M.2    Usui, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.