Investigation of substrate-dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy

Journal of Applied Physics

Volumn 82, Issue 12, 1997, Pages 6041-6046

  Smith, L L ^a   Srinivasan, E ^a   Parsons, G N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLASS; MORPHOLOGY; NUCLEATION; PHASE TRANSITIONS; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; SURFACE STRUCTURE;

AMORPHOUS STRUCTURE; MICROCRYSTALLINE SILICON; SUBSTRATE DEPENDENT NUCLEATION;

SEMICONDUCTING SILICON;

EID: 0031343410     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366471     Document Type: Article

References (24)

1. R. W. Collins and B. Y. Yang, J. Vac. Sci. Technol. B 7, 1155 (1989).
2. R. W. Collins, in Amorphous Silicon and Related Materials (World Scientific, Singapore, 1988), p. 1003.
3. H. V. Nguyen and R. W. Collins, Thin Solid Films 233, 272 (1993).
4. A. M. Antoine and B. Drévillon, J. Appl. Phys. 63, 360 (1988).
5. H. Shirai, B. Drévillon, and I. Shimizu, Jpn. J. Appl. Phys., Part 1 33, 5590 (1994).
6. H. Shirai, R. Ossikovski, and B. Drévillon, Jpn. J. Appl. Phys., Part 1 33, 4177 (1994).
7. N. Layadi, P. Roca i Cabarrocas, B. Drévillon, and I. Solomon, Phys. Rev. B 52, 5136 (1993).
8. J. J. Boland and G. N. Parsons, Science 256, 1304 (1992).
9. S. K. Kim, K. C. Park, and J. Jang, J. Appl. Phys. 77, 5115 (1995).
10. P. Roca i Cabarrocas, S. Hamma, A. Hadjadj, J. Bertomeu, and J. Andreu, Appl. Phys. Lett. 69, 529 (1996).
11. H. Shirai, Jpn. J. Appl. Phys., Part 1 34, 450 (1995).
12. J. J. Boland, Surf. Sci. 261, 17 (1992).
13. T. Arai, T. Nakamura, and H. Shirai, Jpn. J. Appl. Phys., Part 2 35, L1161 (1996).
14. K. Ikuta, Y. Toyoshima, S. Yamasaki, A. Matsuda, and K. Tanaka, Mater. Res. Soc. Symp. Proc. 420, (1996).
15. W. Kern and D. Puotinen, RCA Rev. 31, 187 (1970).
16. G. N. Parsons, Appl. Phys. Lett. 59, 2546 (1991).
17. J. A. Venables, G. D. T. Spiller, and M. Hanbücken, Rep. Prog. Phys. 47, 399 (1984).
18. M. V. R. Murty and H. A. Atwater, Mater. Res. Soc. Symp. Proc. 317, 355 (1994).
19. J. E. Northrup, Phys. Rev. B 44, 1419 (1991).
20. A. R. Miedema, Z. Metallkd. 69, 287 (1978).
21. T. Takai, T. Halicioglu, and W. A. Tiller, Surf. Sci. 164, 341 (1985).
22. S. J. Gregg, in The Surface Chemistry of Solids (Reinhold, New York, 1961), p. 137
23. G. N. Parsons, J. J. Boland, and J. C. Tsang, Mater. Res. Soc. Symp. Proc. 283, 495 (1993).
24. G. N. Parsons, J. J. Boland, and J. C. Tsang, Jpn. J. Appl. Phys., Part 1 31, 1943 (1992).