Investigation of substrate-dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy

Journal of Applied Physics

Volumn 82, Issue 12, 1997, Pages 6041-6046

  Smith, L L ^a   Srinivasan, E ^a   Parsons, G N ^a  

^a Campus Box 7908   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLASS; MORPHOLOGY; NUCLEATION; PHASE TRANSITIONS; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; ROUGHNESS MEASUREMENT; SURFACE ROUGHNESS; SURFACE STRUCTURE;

AMORPHOUS STRUCTURE; MICROCRYSTALLINE SILICON; SUBSTRATE DEPENDENT NUCLEATION;

SEMICONDUCTING SILICON;

EID: 0031343410     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366471     Document Type: Article

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