Defect printability and inspection of EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 1425-1434

  Lu, Bing ^a   Wasson, James ^a   Mangat, Pawitter ^b   Cobb, Jonathan ^a   Hector, Scott D ^a   Pettibone, Don ^c   O'Connell, Donna ^d  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b MOTOROLA INC   (United States)

^c KLA TENCOR CORPORATION   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Defect printability; Engineering Test Stand (ETS); EUV lithography; Inspection

Indexed keywords

DEFECT INSPECTION; DEFECT PRINTABILITY; ENGINEERING TEST STANDARD (ETS); EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

COMPUTER SIMULATION; ERROR ANALYSIS; INSPECTION; MULTILAYERS; OPTIMIZATION; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

MASKS;

EID: 19844383072     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569318     Document Type: Conference Paper

References (11)

1. F. Sobel, et al., "Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber," in Proceedings of SPIE Vol. 5374, p242 (2004).
2. James A. Folta, et al., "Advances in low-defect multilayers for EUVL mask blanks," in Proceedings of SPIE Vol. 4688, p172 (2002).
3. Anton Barty, et al., "EUVL mask blank repair," in Proceedings of SPIE Vol. 4688, p385, (2002).
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6. D. Pettibone, et al., "Inspection of EUVL Reticles," in Proceedings of SPIE Vol. 4688, p362 (2002).
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9. J. R. Wasson, et al., "Integration of Anti-reflection Coatings on EUVL Absorber Stack," in Proceedings of SPIE Vol. 4889, p382 (2002).
10. Donna J. O'Connell et al., "Lithographic characterization of improved projection optics in the EUVL engineering test stand," in Proceedings of SPIE Vol. 5037, p83 (2003).
11. The International Technology Roadmap for Semiconductors, 2003 edition, http://public.itrs.net.