Production of low thermal expansion EUVL mask blanks with low defect multilayer, buffer and absorber

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 242-253

  Sobel, Frank ^a   Aschke, Lutz ^a   Rüggeberg, Frauke ^a   Seitz, Holger ^a   Olschewski, Nathalie ^a   Reichhardt, Torsten ^a   Becker, Hans ^a   Renno, Markus ^a   Kirchner, Steffen ^a   Leutbecher, Thomas ^a   Heß, Günter ^a   Knapp, Konrad ^a  

^a Schott Lithotec AG   (Germany)

Author keywords

Absorber stack; Backside coating; EUVL; LTEM; Mask blank; Multilayer stack

Indexed keywords

CLEANING; COATINGS; MULTILAYERS; POLISHING; SENSITIVITY ANALYSIS; THERMAL EXPANSION;

ABSORBER STACK; BACKSIDE COATING; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); LOW THERMAL EXPANSION MATERIAL (LTEM); MASK BLANK; MULTILAYER STACK;

LITHOGRAPHY;

EID: 3843105714     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533292     Document Type: Conference Paper

References (12)

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