Integration of anti-reflection coatings on EUV absorber stacks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 382-388

  Wasson, J R ^a   Han, S I ^a   Edwards, N V ^a   Weisbrod, E ^a   Dauksher, W J ^a   Mangat, P J S ^a   Pettibone, D ^b  

^a MOTOROLA INC   (United States)

^b NONE

Author keywords

Anti reflective coatings; EUV Lithography; EUV Reticles; Inspection

Indexed keywords

ALGORITHMS; LIGHTING; LITHOGRAPHY; MULTILAYERS; SILICON;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

ANTIREFLECTION COATINGS;

EID: 0037627733     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468104     Document Type: Conference Paper

References (8)

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