Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

Advanced Materials

Volumn 13, Issue 2, 2001, Pages 33-37

  Holdsworth, R J ^a   Martin, P A ^a   Raisbeck, D ^a   Rivero, J ^b   Sanders, H E ^b   Sheel, D ^c   Pemble, M E ^c  

^a UNIVERSITY OF HUDDERSFIELD   (United Kingdom)

^b Pilkington Group Limited   (United Kingdom)

^c UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ELECTRON BEAMS; ENTHALPY; GOLD COMPOUNDS; MOLYBDENUM COMPOUNDS; PRESSURE MEASUREMENT; RHODIUM COMPOUNDS; SUBLIMATION; THERMAL EFFECTS;

ELECTRON BEAM INDUCED DEPOSITION; LOW VOLATILITY PRECURSORS; MOLECULAR VAPOR DEPOSITION; STATIC VAPOR PRESSURE MEASUREMENT; VOLATILE METAL PRECURSORS;

VAPOR PRESSURE;

EID: 0035127033     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (32)