-
1
-
-
0030650827
-
900 V DMOS and 1100 V UMOS 4H-SiC power FETs
-
J.B. Casady, A.K. Agarwal, L.B. Rowland, W.F. Valek, and C.D. Brandt 900 V DMOS and 1100 V UMOS 4H-SiC power FETs Device Research Conference Digest 55 1997 32 33
-
(1997)
Device Research Conference Digest
, vol.55
, pp. 32-33
-
-
Casady, J.B.1
Agarwal, A.K.2
Rowland, L.B.3
Valek, W.F.4
Brandt, C.D.5
-
5
-
-
0033164895
-
A Novel 6H-SiC Power DMOSFET with Implanted P-well Sapcer
-
V.R. Vathulya, and M.H. White A Novel 6H-SiC Power DMOSFET with Implanted P-well Sapcer IEEE Electron Dev Lett 20 7 1999 354 356
-
(1999)
IEEE Electron Dev Lett
, vol.20
, Issue.7
, pp. 354-356
-
-
Vathulya, V.R.1
White, M.H.2
-
8
-
-
0000397834
-
Effect of nitric oxide annealing on the interface trap densities near the band edges in the 4H polytype of silicon carbide
-
C.G.Y. Chung Effect of nitric oxide annealing on the interface trap densities near the band edges in the 4H polytype of silicon carbide Appl Phys Lett 76 2000 1713
-
(2000)
Appl Phys Lett
, vol.76
, pp. 1713
-
-
Chung, C.G.Y.1
-
9
-
-
0001259360
-
Dopant activation and surface morphology of ion implanted 4H- and 6H-SiC
-
M.A. Capano Dopant activation and surface morphology of ion implanted 4H- and 6H-SiC Journal of Electronic Materials 27 4 1998 370 376
-
(1998)
Journal of Electronic Materials
, vol.27
, Issue.4
, pp. 370-376
-
-
Capano, M.A.1
-
11
-
-
0036779129
-
Characterization of interface traps in the subthreshold region of implanted 4H and 6H-SiC MOSFETs
-
Y. Zeng, A. Softic, and M.H. White Characterization of interface traps in the subthreshold region of implanted 4H and 6H-SiC MOSFETs Solid State Electronics 46 10 2002 1579 1582
-
(2002)
Solid State Electronics
, vol.46
, Issue.10
, pp. 1579-1582
-
-
Zeng, Y.1
Softic, A.2
White, M.H.3
-
13
-
-
18844455874
-
Recent advances in 4H-SiC MOS device technology
-
Das MK et al. Recent advances in 4H-SiC MOS device technology. In: ICSCRM 2003
-
ICSCRM 2003
-
-
Das, M.K.1
-
14
-
-
18844452735
-
Step bunching in 6H- and 4H-SiC growth by step-controlled epitaxy
-
T. Kimoto, A. Itoh, and H. Matsunami Step bunching in 6H- and 4H-SiC growth by step-controlled epitaxy Technical Digest of ICSCRM 1995 573 574
-
(1995)
Technical Digest of ICSCRM
, pp. 573-574
-
-
Kimoto, T.1
Itoh, A.2
Matsunami, H.3
-
15
-
-
49349140650
-
On the role of scattering by surface roughness in silicon inversion layers
-
Y.C. Cheng, and E.A. Sullivan On the role of scattering by surface roughness in silicon inversion layers Surface Sci 34 1973 717 731
-
(1973)
Surface Sci
, vol.34
, pp. 717-731
-
-
Cheng, Y.C.1
Sullivan, E.A.2
-
17
-
-
85032069152
-
Electronic properties of two-dimensional systems
-
T. Ando, A.B. Fowler, and F. Stern Electronic properties of two-dimensional systems Review of Modern Physics 54 2 1982 437 496
-
(1982)
Review of Modern Physics
, vol.54
, Issue.2
, pp. 437-496
-
-
Ando, T.1
Fowler, A.B.2
Stern, F.3
-
19
-
-
34547827353
-
Properties of semiconductor surface inversion layers in the electric quantum limits
-
F. Stern, and W.E. Howard Properties of semiconductor surface inversion layers in the electric quantum limits Physics Review 163 3 1967 816 835
-
(1967)
Physics Review
, vol.163
, Issue.3
, pp. 816-835
-
-
Stern, F.1
Howard, W.E.2
-
20
-
-
0001633790
-
The scattering of electrons by surface oxide charges and by lattice vibrations at the silicon-silicon dioxide interface
-
C.T. Sah, T.H. Ning, and L.L. Tschopp The scattering of electrons by surface oxide charges and by lattice vibrations at the silicon-silicon dioxide interface Surface Sci 32 1972 561 575
-
(1972)
Surface Sci
, vol.32
, pp. 561-575
-
-
Sah, C.T.1
Ning, T.H.2
Tschopp, L.L.3
-
21
-
-
18844385037
-
-
private communication
-
Saks N. private communication
-
-
-
Saks, N.1
-
22
-
-
0033098625
-
Detailed investigation of N-channel enhancement 6H-SiC MOSFETs
-
R. Schorner, P. Friedrichs, and D. Peters Detailed investigation of N-channel enhancement 6H-SiC MOSFETs IEEE Trans Electron Dev 46 1999 533 541
-
(1999)
IEEE Trans Electron Dev
, vol.46
, pp. 533-541
-
-
Schorner, R.1
Friedrichs, P.2
Peters, D.3
-
23
-
-
0034318735
-
Characterization of inversion and accumulation layer electron transport in 4H and 6H-SiC MOSFETs on implanted P-type regions
-
V.R. Vathulya, and M.H. White Characterization of inversion and accumulation layer electron transport in 4H and 6H-SiC MOSFETs on implanted P-type regions IEEE Trans Electron Dev 47 2000 2018
-
(2000)
IEEE Trans Electron Dev
, vol.47
, pp. 2018
-
-
Vathulya, V.R.1
White, M.H.2
-
28
-
-
0742321656
-
Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-k dielectrics
-
W. Zhu, J.-P. Han, and T.P. Ma Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-k dielectrics IEEE Trans Electron Dev 51 1 2004 98 105
-
(2004)
IEEE Trans Electron Dev
, vol.51
, Issue.1
, pp. 98-105
-
-
Zhu, W.1
Han, J.-P.2
Ma, T.P.3
-
29
-
-
0023422261
-
Modeling of transconductance degradation and determination of threshold voltage in thin oxide MOSFETs
-
H.-S. Wong, M.H. White, T.J. Krutsick, and R.V. Booth Modeling of transconductance degradation and determination of threshold voltage in thin oxide MOSFETs Solid-State Electron. 30 1987 953
-
(1987)
Solid-State Electron.
, vol.30
, pp. 953
-
-
Wong, H.-S.1
White, M.H.2
Krutsick, T.J.3
Booth, R.V.4
-
30
-
-
18844388260
-
Effect of tilt angle on the morphology of SiC epitaxial films grown on vicinal (0 0 0 1) SiC substrates
-
Powell JA, Larkin DJ, Abel PB, Zhou L, Pirouz P. Effect of tilt angle on the morphology of SiC epitaxial films grown on vicinal (0 0 0 1) SiC substrates. In: ICSCRM 1995
-
ICSCRM 1995
-
-
Powell, J.A.1
Larkin, D.J.2
Abel, P.B.3
Zhou, L.4
Pirouz, P.5
-
33
-
-
18844442969
-
-
Ph.D. Dissertation
-
Zeng Y. Ph.D. Dissertation, 2004. p. 117
-
(2004)
, pp. 117
-
-
Zeng, Y.1
-
35
-
-
18644363008
-
Physics-based numerical modeling and characterization of 6H-siliconcarbide metal-oxide-semiconductor field-effect transistors
-
S.K. Powell, N. Goldsman, J.M. McGarrity, and J. Bernstein Physics-based numerical modeling and characterization of 6H-siliconcarbide metal-oxide-semiconductor field-effect transistors Journal of Applied Physics 92 7 2002 4053 4061
-
(2002)
Journal of Applied Physics
, vol.92
, Issue.7
, pp. 4053-4061
-
-
Powell, S.K.1
Goldsman, N.2
McGarrity, J.M.3
Bernstein, J.4
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