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Volumn 19, Issue 12, 1998, Pages 487-489

High-voltage accumulation-layer UMOSFET's in 4H-SiC

Author keywords

MOS devices; Power MOSFET's; Power semiconductor devices; Power transistors; Silicon carbide

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; EPITAXIAL GROWTH; ION IMPLANTATION; OXIDATION; POWER ELECTRONICS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR GROWTH; SILICON CARBIDE; VOLTAGE MEASUREMENT;

EID: 0032302935     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.735755     Document Type: Article
Times cited : (177)

References (13)
  • 3
    • 11644321128 scopus 로고    scopus 로고
    • High-voltage double implanted MOS power transistors in 6H-SiC
    • Santa Barbara, CA, June 24-26
    • J. N. Shenoy, M. R. Melloch, and J. A. Cooper, Jr., "High-voltage double implanted MOS power transistors in 6H-SiC," (late news)persented at IEEE Device Research Conf., Santa Barbara, CA, June 24-26, 1996.
    • (1996) IEEE Device Research Conf.
    • Shenoy, J.N.1    Melloch, M.R.2    Cooper Jr., J.A.3
  • 8
    • 0031357365 scopus 로고    scopus 로고
    • The planar 6H-SiC ACCUFET: A new high-voltage power MOSFET structure
    • P. M. Shenoy and B. J. Baliga, "The planar 6H-SiC ACCUFET: A new high-voltage power MOSFET structure," IEEE Electron Device Lett., vol. 18, p. 589, 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 589
    • Shenoy, P.M.1    Baliga, B.J.2
  • 10
    • 11644324211 scopus 로고    scopus 로고
    • U.S. Patent 5 168331
    • U.S. Patent 5 168331.
  • 12
    • 0001143273 scopus 로고    scopus 로고
    • Metal-oxide-semiconductor capacitors formed by oxidation of polyerystalline silicon on SiC
    • J. Tan, M. K. Das, J. A. Cooper, Jr., and M. R. Melloch, "Metal-oxide-semiconductor capacitors formed by oxidation of polyerystalline silicon on SiC," Appl. Lett., vol. 70, p. 2280, 1997.
    • (1997) Appl. Lett. , vol.70 , pp. 2280
    • Tan, J.1    Das, M.K.2    Cooper Jr., J.A.3    Melloch, M.R.4
  • 13
    • 0024749835 scopus 로고
    • Power semicooductor device figure of merit for High-frequency applications
    • B. J. Baliga. "Power semicooductor device figure of merit for High-frequency applications." IEEE Electron Device Lett., vol.10. p. 455, 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , pp. 455
    • Baliga, B.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.